Ultrapure Synthetic Fused Silica
The fused, cooled, and polished Fused Silica ingots are classified into various quality grades according to acknowledged measurement and selection procedures, and can be supplied in accordance with individual customer requirements. This means the Fused Silica can be deployed across an optical application spectrum from DUV to NIR.
Your advantages at a glance
- Fused Silica as a polished ingot section or semi-finished product (disc, rod, plate, block, etc.) in five quality grades in terms of homogeneity, absence of striae, and application wavelengths
- Product versatility (includes rods, discs, plates, blocks, prisms) due to manufacturing technology used.
- Fused Silica free of inclusions and bubbles, for laser and optical applications
- Extremely low fluorescence and excellent laser stability due to its high OH and H2 content
- Available with documented optical properties
- High homogeneity
- Low stress birefringence
- High transmission @193 nm and @248 nm
(as per customer-specific requirements)
- SQ0: A 3D material that is free of striae and striations in any functional direction. Recommended for optical elements utilizing multiple light directions, such as prisms or high-curvature lenses.
- SQ1: A 1D material with high homogeneity and free of striae and striations in the functional direction. Typical applications include optical elements such as lenses, discs, plates, wafers, and rods/fibers.
- SQT: Not specified in terms of homogeneity, striae, and striations. This quality grade is recommended for technical applications.
- Excimer-grade Fused Silica – available as SQ1 or SQ0: excellent transmission at 193 nm/
248 nm. Lowest level of laser-induced fluorescence (LIF)
- SQ0-E193/SQ1-E193 (ArF excimer-grade)
- SQ0-E248/SQ1-E248 (KrF excimer-grade)
Virtually free of inclusions and bubbles, the material features an outstanding set of optical and physical properties:
- Laser durability
- Refractive index homogeneity
- Thermal stability and temperature shock resistance
- Low stress birefringence
- Low thermal expansion coefficients
Due to its high OH and H2 content, our Fused Silica exhibits extremely low fluorescence and excellent stability under high-energy UV and laser radiation.
Fields of use
- Excimer laser optics and beam guiding systems
- DUV and UV optical components
- Optical material in line beam systems used in OLED manufacturing
- UV rods, preforms and optical fibers
- Laser fusion
- For Fused Silica vessels and windows in technical applications
- Lithography and microlithography applications: stepper lenses, photo mask blanks, wafers and lithography optics